Although China has become a major semiconductor producer in the world, the overall industrial chain of the panel industry is still relatively backward. At present, most of the upstream high-end electronic chemicals (resin for LCD) rely on imports. It is necessary to accelerate the basic research and industrialization of key core materials in the panel industry in order to support the future development of China's microelectronics industry and the establishment of international "status".

The color film has less photoresist and can't produce beautiful pictures.

The display is an important interface for people to communicate with the machine. Photoresist is an important part of the whole lithography process, and is one of the highest microelectronic chemicals in the world. It is mainly used in integrated circuits and flat panel display industries. Lithography determines the integration of integrated circuits and leads the advancement and implementation of technology nodes.

In our daily work and life, the reason why we can see the colorful picture on the display screen is that we can't do without a layer of color film with a thickness of only 2μm on the screen but 16% of the panel cost. However, the color of the color film must be produced by the photoresist.

The LCD is a non-active light-emitting device. The color display must be provided by its own backlight system or external ambient light. The gray-scale display is formed by the driver and the controller, and the color filters are used to generate the three primary colors of red, green and blue. The principle forms a color display.

Among them, depending on the color, the photoresist can be classified into four types: black, red, green, and blue. The color filter is fabricated by applying a black photoresist on a glass substrate to form a black matrix, and then applying red, green, and blue photoresist to produce three primary color pixels.

The key to the development of photoresist is that its composition is complex and the process technology is difficult to master. The main components of photoresist are polymer resin, color paste, monomer, photoinitiator, solvent and additives. The technical problems involved in the development of the photoresist are numerous. It needs to be determined and optimized from the structure design and screening of oligomers, and the optimization and activity of the synthesis process. Monomer screening and control, color paste fineness control and stabilization, product formulation design and optimization, product production process optimization and stability, end-use condition matching and latitude adjustment are adjusted. Therefore, it is very difficult to develop and produce independently.

In the development of photoresist, China started late and began to pay attention after 2000. In recent years, although there has been rapid development, the overall situation is still in its infancy. In fact, the level of process technology is very different from that of foreign companies, especially the cutting-edge materials and equipment are still dependent on imports.

Process technology is difficult to break through, domestic companies are subject to people

There are many reasons for the gap with the international advanced level. In the past, due to China's planning and development of the integrated circuit industry, the layout was unreasonable and incomplete, especially the investment in heavy production and processing, while ignoring the most important basic materials, equipment and application research. At present, the entire industry is strong in intermediate processing, and the front and rear ends are weak. The core technology has been monopolized by Japanese companies such as TOK, JSR, Sumitomo Chemical, and Shin-Etsu Chemical.

 

The main technical indicators of photoresist are resolution, development time, amount of foreign matter, adhesion, and impedance. Every technical indicator is important and must be met before all indicators can be used. Therefore, foreign companies have long blocked China in terms of formula, production technology and so on.

In fact, China is relying on its own experience in the absence of experience, lack of professional and technical personnel, and the lack of key upstream raw materials. In recent years, despite the breakthrough in the development of photoresists, domestic photoresists are still not used. At present, foreign impedance has reached more than 15 powers, while domestic enterprises can only achieve 10 powers, which can not meet the requirements of customer process requirements and product upgrades. Some processes are up to standard, but batch stability is not good.

Basic research still needs to be exerted, the government should pay attention to encourage the application of traction

The photoresist that can make the display screen colorful is still the "pain" of the Chinese semiconductor industry. How to break the blockade and monopoly of countries and regions such as Europe, America and Japan?

The industry believes that according to the current "single-handed" research and development path, certainly not. Relevant government departments should increase the supporting support of industrial policies, and should start from the acceleration of the improvement of the entire industrial chain, and stratify the key core electronic chemicals that are lacking in the domestic industry and have high industrial dependence. It is necessary to develop electronic chemicals with high difficulty and testing equipment requirements. With its high characteristics, the organization brings together some advantageous enterprises and experts to form an industrial alliance. The state establishes a demonstration platform for production and application, and concentrates on breaking through some key technologies.

Some experts have suggested that although domestic photoresists cannot be used in high-end panels, the government still has to encourage domestic manufacturers of ordinary panel panels to use them as soon as possible. Only in the application process can we find problems, solve problems, continuously improve the level of technology, process and products, realize the localization of key electronic chemical materials in China, improve the industrial chain of China's integrated circuits, and meet the needs of the country and key industries.

The national science and technology major special extreme ultraviolet photoresist project passed the acceptance

On May 24th, the National Science and Technology Major Project “Massive Large Scale Integrated Circuit Manufacturing Equipment and Complete Process” (hereinafter referred to as “02 Major Special Project” Implementation Management Office organized task acceptance expert group and financial acceptance expert group on 02 major special item “Ultraviolet light” The project of engraving materials and laboratory testing technology has carried out task acceptance and financial acceptance.

The participating experts listened to the report of the project leader and project leader on the completion of the project and the project, the test report of the test group, the financial performance report, etc., and reviewed the acceptance data. After careful discussion, the participating experts unanimously agreed that the project passed the acceptance.

The Outline of the National Medium- and Long-Term Science and Technology Development Plan (2006-2020) identifies a number of priority themes in key areas, further focuses on national goals, and selects some major strategic products, key common technologies or major projects. Major projects, striving for breakthroughs, and striving to achieve a leap-forward development of productivity with a partial leap in technological development.

"Extremely Large Scale Integrated Circuit Manufacturing Equipment and Complete Process" Special Project (02 Special Project) "Extreme UV Photoresist Material and Laboratory Testing Technology Research" by Institute of Chemistry, Chinese Academy of Sciences, Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing Kehuawei Electronic Materials Co., Ltd. jointly undertakes.

After the efforts of all members of the project team, the design, preparation and synthesis process of EUV photoresist key materials, formulation composition and photoresist preparation, and preliminary evaluation of laboratory photoresist performance were completed. The assessment indicators for materials and equipment specified in the book. The project has applied for 15 invention patents (including 5 international patents). Up to now, it has obtained 10 authorized patents (including 3 international patents).

The participating experts fully affirmed the research and development achievements of the project, pointing out that the development of EUV photoresist has a strategic vision. After several years of efforts of the project team members, the R&D task was successfully completed and reached the requirements in the project task book. Indicators; established a research and development team in the field of high-grade photoresist, providing talent support for the stable development of China's semiconductor integrated circuit industry.

In the speech, the relevant person in charge of the Institute of Physics and Chemistry of the Chinese Academy of Sciences and the project responsible unit of the Chinese Academy of Sciences expressed sincere gratitude to the expert group for its support to the photoresist R&D team for many years. The research and development of high-end electronic chemicals in China is in a period of rapid development. The completion of this project will provide an important guarantee for the stable development of China's semiconductor industry. It is hoped that continuous support will be given to the research and development of high-grade photoresist. Encourage the R&D team to continue their efforts to make use of the advantages of design and preparation in the field of special materials to make their own contribution to the development of China's semiconductor industry.

The responsible personnel and experts of the major special projects of the Ministry of Science and Technology, the Beijing Municipal Economic and Information Technology Commission, the 02 Major Specialized Office, the 02 Major Specialized Group and the 02 Major Specialized Office, and the relevant units of the financial acceptance experts and other experts participated in this Acceptance meeting.